Growth and characterization of Sb2Te3 thin films prepared by MOCVD technique in horizontal reactor
B. Aboulfarah, A. Mzerd, A. Boulouz, A. Giani, A. Foucaran, A. Boyer
Abstract
In this paper the electrical and thermoelectrical performances of p-type Sb2Te3, elaborated by metal organic chemical vapour deposition (MOCVD) in horizontal quartz reactor on pyrex glass substrate arc discussed. The quality of the deposited layers is controlled by X-ray diffraction, Scanning Elecrtron Microscope (SEM), Energy dispersive X-ray spectroscopy (EDX), and Hall effect. The deposition optimal conditions are: substrate temperature equal to 450°C, the pressure ratio R= VI/V is varied from 1 to 13 and TESb partial pressure is about 1 x] 0.4 atm. It is found that the electrical properties of Sb2Te3, change remarkably with VI/V ratio and exhibited a polyerystalline structure. The measurement of the Seebeck coefficient (115µV/K) and the mobility (196cm2/V.s) leads us to confirm the significant potential of the OMCVD method to obtain a good material promising for thermoelectric applications.