Indexing metadata

Modeling of Fowler-Nordheim current of metal/ ultra-thin oxide/ semiconductor structures


 
Dublin Core PKP Metadata Items Metadata for this Document
 
1. Title Title of document Modeling of Fowler-Nordheim current of metal/ ultra-thin oxide/ semiconductor structures
 
2. Creator Author's name, affiliation, country Y. Khlifi; Laboratoire d’Electronique Appliquée et d’Automatique (LEAA), Université Mohamed Ier, Faculté des Sciences, Dépt de Physique, Oujda Laboratoire de Physique du Solide (LPS), Université Mohamed I er ,Faculté des Sciences, Dépt de Physique, Oujda; Morocco
 
2. Creator Author's name, affiliation, country K. Kassmi; Laboratoire d’Electronique Appliquée et d’Automatique (LEAA), Université Mohamed Ier, Faculté des Sciences, Dépt de Physique, Oujda; Morocco
 
2. Creator Author's name, affiliation, country L. Roubi; Laboratoire de Physique du Solide (LPS), Université Mohamed I er ,Faculté des Sciences, Dépt de Physique, Oujda; Morocco
 
2. Creator Author's name, affiliation, country R. Maimouni; Laboratoire d’Electronique Appliquée et d’Automatique (LEAA), Université Mohamed Ier, Faculté des Sciences, Dépt de Physique, Oujda; Morocco
 
3. Subject Discipline(s)
 
3. Subject Keyword(s)
 
4. Description Abstract In this paper we present results of a modeling of the current-voltage characteristics of metal/ultra-thin oxide/semiconductor structures with negatively biased metal gate (V<0), when the oxide thickness varies from 45Å to 80Å. We analyze the theoretical influence of the temperature and Schottky effect on the Fowler-Nordheim (FN) conduction. The results obtained show that these influences depend on the electric field in the oxide and on the potential barrier at the metal/oxide interface. At the ambient temperature, the influence on this potential barrier is lower than 1.5%. However, it can reach 45% on the pre-exponential coefficient of the FN current. It is therefore necessary to consider in the FN classical conduction expression a correction term that takes account the temperature and Schottky effects. These results are validated experimentally by modeling the current-voltage characteristics of the realized structures at high field.
 
5. Publisher Organizing agency, location
 
6. Contributor Sponsor(s)
 
7. Date (YYYY-MM-DD) 09-03-2011
 
8. Type Status & genre Peer-reviewed Article
 
8. Type Type
 
9. Format File format PDF
 
10. Identifier Uniform Resource Identifier https://revues.imist.ma/index.php/MJCM/article/view/63
 
11. Source Title; vol., no. (year) Moroccan Journal of Condensed Matter; Vol 3 (2000)
 
12. Language English=en en
 
13. Relation Supp. Files
 
14. Coverage Geo-spatial location, chronological period, research sample (gender, age, etc.)
 
15. Rights Copyright and permissions Copyright (c)