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Optical characterization of a-Si : H thin films grown by Hg-Photo-CVD


 
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1. Title Title of document Optical characterization of a-Si : H thin films grown by Hg-Photo-CVD
 
2. Creator Author's name, affiliation, country A. Barhdadi; Laboratoire de Physique des Semi-conducteurs et de l'Energie Solaire (P.S.E.S.) Ecole Normale Supérieure, P.O. Box: 5118, Takaddoum, Rabat 10000 Unité de Formation et de Recherche en Physique de la Matière Condensée et Modélisation Statistique des Systèmes, Faculty of Sciences, University Mohammed V-Agdal, Rabat 10000 The Abdus Salam International Centre for Theoretical Physics (ICTP), 34014, Trieste, Italy; Morocco
 
2. Creator Author's name, affiliation, country S. Karbal; Laboratoire de Physique des Semi-conducteurs et de l'Energie Solaire (P.S.E.S.) Ecole Normale Supérieure, P.O. Box: 5118, Takaddoum, Rabat 10000 Unité de Formation et de Recherche en Physique de la Matière Condensée et Modélisation Statistique des Systèmes, Faculty of Sciences, University Mohammed V-Agdal, Rabat 10000; Morocco
 
2. Creator Author's name, affiliation, country N. M’gafad; Laboratoire de Physique des Semi-conducteurs et de l'Energie Solaire (P.S.E.S.) Ecole Normale Supérieure, P.O. Box: 5118, Takaddoum, Rabat 10000 Unité de Formation et de Recherche en Physique de la Matière Condensée et Modélisation Statistique des Systèmes, Faculty of Sciences, University Mohammed V-Agdal, Rabat 10000; Morocco
 
2. Creator Author's name, affiliation, country B. M. Aka; Département des Sciences et Technologie, Ecole Normale Supérieure, University Abobo-Adjamé P.O. Box 1561, Abidjan 22; Côte d'Ivoire
 
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4. Description Abstract

Mercury-Sensitized Photo-Assisted Chemical Vapor Deposition (Hg-Photo-CVD) technique opens new possibilities for reducing thin film growth temperature and producing novel semiconductor materials suitable for the future generation of high efficiency thin film solar cells onto low cost flexible plastic substrates. This paper provides some experimental data resulting from the optical characterization of hydrogenated amorphous silicon thin films grown by this deposition technique. Experiments have been performed on samples deposited at different temperatures, with and without thermal annealing.

 
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7. Date (YYYY-MM-DD) 17-03-2011
 
8. Type Status & genre Peer-reviewed Article
 
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9. Format File format PDF
 
10. Identifier Uniform Resource Identifier https://revues.imist.ma/index.php/MJCM/article/view/214
 
11. Source Title; vol., no. (year) Moroccan Journal of Condensed Matter; Vol 11, No 1 (2009)
 
12. Language English=en en
 
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15. Rights Copyright and permissions Copyright (c)