Preparation And Characterisation Of Zno Thin Films Deposited By SILAR Method

A. Raidou, M. Aggour, A. Qachaou, L. Laanab, M. Fahoume

Abstract


Zinc oxide (ZnO) thin films were grown on glass and copper substrates by the Successive Ionic Layer Adsorption and Reaction (SILAR) technique.
ZnO films are obtained by successive immersion of a substrate in an aqueous solution containing: ZnSO4 with different molarities, 6ml/100ml 13.15 M aqueous ammonia solution and in deionised water heated at different temperatures.
We studied the structural, morphological and optical properties with the deposition parameters (pH, bath temperature, number of cycles…)
The structural, morphological surface and optical properties of the films have been studied by using X-ray diffraction (XRD), scanning electron microscopy (SEM) and UV-VIS-spectrophotometer. Effects of experimental parameters and heat treatment on the structural and optical properties were discussed. The X-ray diffraction analysis shows that the films are polycrystalline with zincite hexagonal structure with the preferential orientation of (002) plan.
The study of surface morphology reveals that deposited ZnO films take many shapes: nanorods, nanoprisms, flower-like, needles, spindles and hexagonal structures. Obtained ZnO films exhibit a high transmittance of 90% in visible band, and optical band gap of 3.27 eV.

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